LASER SURFACE PROCESSING LABORATORY
Research at the LSPL
The Laser Surface Processing Group (LSPG) at Faculty of Sciences of the University of Lisbon (FCUL) has been involved with research and development of laser-assisted microtechnologies, in contractual support with national and EU institutions. Early efforts were focused on growth of ceramic hard materials based on nitrides, carbides and oxides by Laser-assisted CVD, seen as protective layer or sacrificial (diffusion barrier) interlayer. Synthesis/structure/property relationships have been investigated. The interest on laser microprocessing has been extended to laser ablation/micromaching of electronic and ceramic materials, using pulsed UV lasers, and spatial and temporal resolved spectroscopic diagnosis is currently being used to help to understand basic phenomena in laser processing of micro- and nano-structures. Current work comprises to use the versatility and high potential of LCVD method to access the synthesis of ternary and quaternary superhard coatings and metallic oxides, and to investigate the synthesis of novel artificially structured oxide coatings with the aid of pulsed lasers (PLD).
The Group has also experience on materials and surface characterisation techniques. Their relevant facilities are: laser-assisted CVD system based on both IR CO2 laser (cw, 1 kW) and UV excimer laser (KrF, 248 nm and ArF, 193 nm), high vacuum reactor (10-7 mbar), XY positioning stage with CNC control, vacuum measurement gauges, capacitive manometers, flow rate controllers; pulsed laser deposition (PLD) system based on UV excimer laser (KrF, 248 nm and ArF, 193 nm), high vacuum reactor (10-6 mbar), rotating target holder, vacuum measurement gauges, capacitive manometers; plasma diagnosis coupled to the PLD system: optical spectrometer and intensified 12 bit CCD camera/detector for space and time resolved emission spectroscopy and fast imaging; X-ray diffractometer with Bragg-Brentano (XRD) and glancing incidence (GIXRD) configurations; laser profilometer for surface topography and thickness measurements; metallography/sample preparation: metallographic polisher, diamond and abrasive saws, optical microscope, vacuum and inert atmosphere annealing furnaces.
Access to other facilities situated within 4 km from our laboratory: scanning electron microscope (SEM) with EDS, transmission electron microscope (TEM), atomic force microscope (AFM), Auger/XPS spectrometers, Fourier- and micro-Transform IR spectrometers, Raman and micro-Raman spectrometers, two-wavelength ellipsometer.